Our micro-patterned optical filters combine patented microlithography expertise with state-of-the-art coating technology to enable smaller and simpler optical designs for portable or complex optical systems. This exclusive technology allows patterning multiple dielectric, metal, and color filter arrays on a single substrate.
Standardized processes have been developed and are used today to manufacture these filter arrays in a new, world-class optical semiconductor waferfab designed explicitly for this purpose. The process is scalable to wafer-level glass or semiconductor volume production and supports millions of custom micro-patterned optical devices delivered annually.
Salvo Coatings patterned coatings are used to enhance performance in many biomedical, industrial, and aerospace OEM applications – enabling next-generation integrated optical devices that are more compact, robust, and cost-effective.
Here at Salvo Technologies focus our operations on supporting customers in developing their next-generation imaging and sensing equipment. With a toolbox of processes and technologies, we can quickly design the most effective way to develop products based on your application or product functionality. Our application engineers work with you to quickly assess your requirements and provide a proposal of technical feasibility.
The equipment in our Class 100/1000 wafer fabrication cleanrooms have been selected and custom-designed for micro-patterned coatings, enabling us to support ultra-small (μm) pixel-level features for imaging applications. We use the latest coating technology, including IAD evaporation, magnetron sputtering, and ion beam sputtering techniques.
Semiconductor-style mask aligners handle wafers up to 8 inches in the lithography fab.
Patents cover our patterned optical filters in micro-patterning technologies (US patent 7648808) and pixel filter array on substrate (either on glass or directly on sensor/detector wafers) methodologies (US patent 6638668).
High-performance Pattern Dicrohic filter.